发布时间：2023/03/07 浏览量：2623

Concept ONE 设备改造介绍

   一、 C1 CVD DIELECTRIC SYSTEM 设备简述：

    It is the benchmark in production dependability and process flexibility

    The concept one is the culmination of a revolutionary design concept and a severn-year proces of continuous improvment driven by the production experience of an installed base of 600 systems . The unique multistation ,sequential deposition architecture of the Conecpt One process chamber probvides an unmatched ability to deposit high quality dielectric films with the high throughput and dependabiity required for volume productioin. 

       C1 是一个革命性设计，是Novellus 持续7年改进过程的结晶。该系统过程是建立在600套安装基础的生产经验上。C1 独特的多腔室沉积结构，提供无与伦比的沉积高质量薄膜的能力，具有量产的高吞吐性和可靠性。

    This design is leberaged by a number of equipment and process innovations which result in an advanced CVD system that offers superior process reqroducibility and microcontamination control , excellent system availability and the ability to accommodate a variety of advanced dielectric proces in the same chamber -- all at the industry's highest productivity per capital investment.

       C1设计，借鉴吸收了许多设备和工艺创新，该系统提供卓越的工艺再现和微污染控制。  出色的系统可用性，在同一腔室可适应各种先进电介质工艺能力。在当时这是业内最高的人均资本投资产出率。

      The  CONCEPT ONE features several innoviation which have become the industry standard for the reliable production of high quality dielecric films . These include the multistation , sequential deposition design for wide process windows and high throughtput , dual frequency deposition for superior step coverage, stress control and file quality , large mass , thermally stable resitive heating for precise temperature control, and the sigma 6TM  LiQUID TEOS injection system for highly reproeducible delivery of liquid sources to the process chamber - all of which contribute to precise process control and excellent wafer quality.

       C1 的多项创新，已成为生产高质量介电薄膜的行业标准。其中包括多工位、多窗口高吞吐量的顺序沉积设计，。。。， 所有这些都有助于精确的工艺控制和出色的晶圆质量控制。 

     High net throughput in a small footprint enables the CONECPT ONE to provide very high throughput density , combined with the system's ability to accommolate a veriety of processes and wafer size in the same chanber.

    

    The concept one provides superior cost of ownership for the widest variety of production proven processes.

    二、CONECEPT ONE CVD DIELECTRIC SYSTEM 设备主要特点 ：

    1.  MULTISTATION , SEQUENTIAL DEPOSITION PROCESS CHAMBER :

     The  concept one feacture a multistation , sequential deposition procese chamber which produces high throughputs by processing multiple wafers simultaneously. Wafer pass sequentially through multiple deposition stations ; therefore all wafwrs see the same process conditions, averaging out random variations which may occur.

    

   C1 的多腔体，可同时处理多个晶圆产生高的产量。

   2. LOADOCK CHAMBER 

    The loadlock chamber is capable of accommodating either 50 or 70 wafer loads, and features an optimized single arm robot to minimize wafer transport overhead. During process, the loadlock is maintained slightly above process chamber pressure to minimize particulate and wafer exchange time. The loadlock is maintained at positive pressure during cassette exchange to prevent particles form entering the system from the cleamrooms.

     负载锁室拥有50-70个晶圆上载能力，最大限度减少晶圆运输。在生产中，负载内保持略高于工艺腔体的压力，保证最大限度减少颗粒污染和减少晶圆交换时间。装载锁在暗盒更换期间保持正压，防止颗粒从洁净室进入腔体。

   3.  PRODUCTION PROVEN PROOCESSES 

   The concept one introduced a number of innovation which have set industry standard, including : dual frenquency deposition for improved step coverage. film quality and stree control ; resistive heating for enhanced process and particle control ; and the sigma 6 tm liquid TEOS injection system for unpreceedented production reproducibility .

   The system come with a full range of production provens process for silane oxide , TEOS , Doped teos , si3N4 and Sion ,all with inductry leading guarantees.

    

 C1 的创新，奠定多项行业标准。包括沉积提供阶梯覆盖率、薄膜质量和应力控制。用于增强过程和颗粒控制的电阻加热。以及sigma 6 TM 液态 TEOS 注入系统，实现前所未有的生产再现性。

  三、C1 设备系统优点介绍

    1. DIELECTRI  TECHNOLOGY LEADERSHIP

    Beginning with multistatin , sequential deposition chamber design , the concept one pionneered a number of innovation that provide industry leading manufacturing performance . By depositing a portionof total film thickness at each stations , the system achieves excellent within-wafer and wafer-to-wafer film uniformity by averaging any process anomalies that may occur at  individual deposition station. Every wafer experience the same process envirmoent , providing a single narrow distribution of process results. As a result , the concept one offers the industry's only Cp guarantee for all standard films.

    C1 多腔室沉积，开创多项创新。该系统对晶圆薄膜可能在单个腔体发生的任何工艺异常进行平均，实现晶圆内和晶圆间薄膜的出色均匀性。

    Novellus also introduced dual frequency deposition to CVD , with nearly 600 dual frequency system in volume production. Noves lead the industry in dual frequency experience. Dual trequency enhance film quality and step coverage in high aspect ratio applications and allows precise control over film stress characteristics.

    2. Compact footprint 

    The concept one's small footprint lowers overall cost of ownership while providing very high throughput density . Two concept one systems occupy less cleanroom space than three multichamber single wafer ststems, while at the same time providing significantly higher overall throughput.  As a result , the Concept one can dramatically reduce the cost associated with cleanroom construction and facilitization without sacrificing overall fab output.

     

       C1 占地面积小，可减少总体成本。同时提供非常高的吞吐量，多室单晶圆系统，占用更少的洁净室腔体空间，同时提供更高吞吐量。C1 可显著减少洁净室建设成本，同时不会牺牲晶圆产量。

   3. System flexibility

   The high throughput of the multistation process chamber allows processes to run at low deposition rates and contributes to the systems's wide process windows. This allows the concept one to deposit all standard dielectric films in the same chamber without hardware changes.  As a result , the Concept one offers complete self-redundancy for doped and undoped silane and TEOS oxides and all standard nitride films. The system also accommodates a variety of wafer size 125 150 and 200mm with no modification to the process chamber.

       C1 可在同一腔室沉积所有标准介电薄膜，包括4寸 6寸和8寸。

   4. Guaranteed prodcution performance :

    The high throughput provided by the multistation ,sequential deposition architecture allows processes to be tuned for optimal results rather than for high deposition rates . This results  in wide process windows and consistent results with a 

high degree of statistical control.

      C1 的多站顺序沉积结构，提供高吞吐量允许调整工艺，获得最佳结果，而不是高沉积率。

   四、君睿科技提供的C1 设备系统改造业务：

     1. 软件升级 ，将原来的DOS系统升级为 windows 10 

     2. 将所有的步进马达和驱动，都替换为新的伺服马达和驱动；

     3. 将很多国外断供的零件，在国内重新组织配件的生产供应，如陶瓷件、o-ring 、金属腔体件等；

     我们在升级改造中，不断总结，对部分国外难以供应的高成本备件，进行国内供应链再造。帮助我们的客户方便快捷和低成本获得绝大多数NOVELLUS  Concept One 的零配件。

     我们提供机器人总成 one arm robot assy 、主轴总成 spindle assy ,机架 romote AC rack 、加热陶瓷隔离器总成 heater ceramic isolator assy 、heater block 150mm 200mm , shower head 150mm 200mm、Top / bottom plate assy 150 200mm、（inch gate throttle ect ）valves. 

    具体配件，按照11个大的子类别，可分为 GAS SYSTEM 、vacuum system、Process chamber 、Block 、wafer spindle  mechanism 、loadlock chamber、wafer transfer Mech 、one arm robot assy 、electrical systems 、control systems 和RF GENERATOR. 

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    1.  https://www.junr.com.cn/v/list/id/130.html

    2.  https://www.junr.com.cn/v/list/id/130/page/2.html

    3.   https://www.junr.com.cn/v/list/id/130/page/3.html

    您有任何关于NOVELLUS concept one 机台的改造翻新、设备培训和零配件替换需求，欢迎与君睿科技联系！